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December 24, 2012 Newswires
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U.S. Patents Awarded to Inventors in New York (Dec. 24)

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ALEXANDRIA, Va., Dec. 24 -- The following federal patents were awarded to inventors in New York.

***

Swiss Reinsurance Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Swiss Reinsurance, Zurich, has been assigned a patent (8,335,710) developed by Richard Pennay, New York, for "unidirectionally protected, fully automated asset allocation and asset monitoring apparatuses, and a corresponding method."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A computer-aided asset allocation and asset monitoring apparatus comprising a unidirectional, data-protected control signal apparatus, in which data from locally arranged, protected databases can be transferred via a network to the asset allocation and asset monitoring apparatus and can be evaluated and in which electronic control signals and/or control data can be transmitted to at least one authorized receiver station."

The patent application was filed on June 30, 2008 (12/165,535). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,35,710.PN.&OS=PN/83,35,710&RS=PN/83,35,710

Written by Amal Ahmed; edited by Jaya Anand.

***

Corning, Shanghai Institute of Ceramics Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Corning, Corning, N.Y., and Shanghai Institute of Ceramics, Shanghai, China, have been assigned a patent (8,333,912) developed by six co-inventors for a "thermoelectric composite material and method of producing the same." The co-inventors are Lidong Chen, Shanghai, China, Monika Backhaus-Ricoult, Horseheads, N.Y., Lin He, Horseheads, N.Y., Zhen Xiong, Shanghai, China, Xihong Chen, Shanghai, China, and Xiangyang Huang, Shanghai, China.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A process for making a composite material and the composite materials having thermoelectric properties."

The patent application was filed on July 9, 2010 (12/833,401). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,33,912.PN.&OS=PN/83,33,912&RS=PN/83,33,912

Written by Amal Ahmed; edited by Jaya Anand.

***

Accenture Global Services Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Accenture Global Services, Dublin, Ireland, has been assigned a patent (8,335,730) developed by David A. Davidson, Cumming, Ga., Scott P. Elsky, Brooklyn, N.Y., and William A. Parkan, Pearland, Texas, for a scorecard reporting system.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A data processing system generates a scorecard analysis that displays multiple scorecard windows, each directed to a specific different perspective on a particular business function. Each perspective may have at least one corresponding objective, and each objective may have at least one corresponding key performance indicator. Each scorecard may include drill down capability from a top level analysis to more detailed information on a perspective, objective, or key performance indicator."

The patent application was filed on July 2, 2010 (12/830,171). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,35,730.PN.&OS=PN/83,35,730&RS=PN/83,35,730

Written by Amal Ahmed; edited by Jaya Anand.

***

New York Inventor Develops Patent for Method of Assessing a Parking Fee Based Upon Vehicle Make and Model

ALEXANDRIA, Va., Dec. 24 -- Joshua H. Burdick, New York, has developed a patent (8,335,711) for a "method of assessing a parking fee based upon vehicle make and model."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method for assessing fees for parking is disclosed. The method includes providing a vehicle registration card containing a vehicle make and model and a parking fee collection device. The parking fee collection device has an associated database containing a parking fee charged for each vehicle make and model. The vehicle make and model is entered into the parking fee collection device for a selected vehicle and a parking fee is assessed based upon the vehicle make and model."

The patent application was filed on Feb. 9, 2010 (12/702,467). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,35,711.PN.&OS=PN/83,35,711&RS=PN/83,35,711

Written by Amal Ahmed; edited by Jaya Anand.

***

Stryker Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Stryker, Kalamazoo, Mich., has been assigned a patent (8,332,979) developed by Roland E. Flick, Elma, N.Y., Scott Endress, Orchard Park, N.Y., and Edward Mazzu, Hamburg, N.Y., for a "cushion bladder with middle layer having gaps and various positioned interior welds." The abstract of the patent published by the U.S. Patent and Trademark Office states: "A cushioning device has a first material and an opposing second material that are sealed together at the peripheral edges to form a first (right) side, a first (head) end, a second (left) side, and a second (foot) end. Positioned between the first material and the second material is a middle material. The middle material has a top side, a bottom side, a first gap between the first side and the middle material and a second gap between the second side and the middle material. In addition, the first material is sealed to the middle material's top side at a first set of locations to form a first set of interior welds. The second surface is sealed to the middle material's bottom surface at a second set of locations to form a second set of interior welds. The first set of interior welds on the middle material's top surface and the second set of interior welds on the middle material's bottom surface are not superimposed on each other or overlap each other."

The patent application was filed on Aug. 6, 2009 (12/536,995). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=8,332,979.PN.&OS=PN/8,332,979&RS=PN/8,332,979

Written by Kusum Sangma; edited by Anand Kumar.

***

Lion Apparel Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Lion Apparel, Dayton, Ohio, has been assigned a patent (8,332,963) developed by four co-inventors for a "protective garment with curved and protected extremities." The co-inventors are Ali Razzaghi, New York, Eric Fehlberg, Queens, N.Y., Caleb Crye, Brooklyn, N.Y., and Gregg Thompson, Brooklyn, N.Y. The abstract of the patent published by the U.S. Patent and Trademark Office states: "A protective garment including a body portion and an extremity permanently coupled to the body portion. The extremity includes a joint that provides the extremity with a bent position forming an acute angle relative to a vertical axis when the extremity is at rest without an arm or leg of a wearer received therein." The patent application was filed on May 3, 2011 (13/099,900). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=8,332,963.PN.&OS=PN/8,332,963&RS=PN/8,332,963

Written by Kusum Sangma; edited by Anand Kumar.

***

Herman Miller Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Herman Miller, Zeeland, Mich., has been assigned a patent (8,333,038) developed by nine co-inventors for a wall mounted assembly. The co-inventors are Mark Bates, Westwood, Mass., Andrew J. Boyce, Hopkinton, Mass., Chul Min Kang, Coral Springs, Fla., Michael J. Katje, Grand Haven, Mich., Susan R. Lyons, New York, Kurt E. Porter, Holland, Mich., Jeffrey D. Roetman, West Olive, Mich., Perry L. Sellers, Hudsonville, Mich., and Gianfranco Dino Zaccai, Needham, Mass.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A wall assembly includes at least one horizontally extending rail having a rear surface adapted to engage the wall. A plurality of horizontally spaced and vertically extending stiles are coupled to the rail, with the stiles disposed forwardly of the rear surface of the rail. A plurality of interface components are coupled to the plurality of stiles. In various embodiments, the stiles may be interconnected to draw together adjacent interface components. The interface components also may include overlapping upper and lower edges. The stiles may be vertically and/or horizontally (laterally and longitudinally) adjustable relative to the rail. A lock member may be provided to secure at least one of the stiles to the rail. Various systems and methods of assembly and use are also provided."

The patent application was filed on Feb. 8, 2011 (13/023,007). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,038&OS=8,333,038&RS=8,333,038

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Kimber IP Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Kimber IP, Yonkers, N.Y., has been assigned a patent (8,333,028) developed by Yury Karfiol, Brooklyn, N.Y., and John Goliber, Leonia, N.J., for a "firearm mode selection mechanism."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A mode selection mechanism for a firearm is provided including a lever having an exposed surface and an inner surface and a pivot pin and a detent pin depending from the inner surface, the pivot pin extending through a orifice in the frame, the detent pin extending generally parallel to the pivot pin. The lever is pivotable from a first position to a second position about the pivot pin, wherein the detent pin moves in an arc-shaped aperture in the frame. A flexible stop includes an open ring of spring metal and is disposed in a ring orifice in the frame. The detent pin is disposed against the flexible stop wherein, as the lever is moved from the first position to the second position, the flexible stop compresses and then uncompresses thereby creating a detent."

The patent application was filed on Jan. 31, 2011 (13/017,105). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,028&OS=8,333,028&RS=8,333,028

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Taiwan Semiconductor Manufacturing Assigned Patent for Metal Gate Stress Film for Mobility Enhancement in FinFET Device

ALEXANDRIA, Va., Dec. 24 -- Taiwan Semiconductor Manufacturing, Hsin-Chu, Taiwan, has been assigned a patent (8,334,570) developed by four co-inventors for a "metal gate stress film for mobility enhancement in FinFET device." The co-inventors are Jeff J. Xu, Jhubei, Taiwan, Clement H. Wann, Carmel, N.Y., Chi Cheh Yeh, Taipei, Taiwan, and Chi-Sheng Chang, Hsinchu, Taiwan.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A CMOS FinFET semiconductor device provides an NMOS FinFET device that includes a compressive stress metal gate layer over semiconductor fins and a PMOS FinFET device that includes a tensile stress metal gate layer over semiconductor fins. A process for forming the same includes a selective annealing process that selectively converts a compressive metal gate film formed over the PMOS device to the tensile stress metal gate film."

The patent application was filed on March 4, 2011 (13/041,066). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,570&OS=8,334,570&RS=8,334,570

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Kimber IP Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Kimber IP, Yonkers, N.Y., has been assigned a patent (8,333,142) developed by Yury Karfiol, Brooklyn, N.Y., and John Goliber, Leonia, N.J., for a "firearm slide cam surface for cartridge feed."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A slide for a semi-automatic pistol is provided where the pistol has a frame, a slide mounted on the frame, a barrel mounted between the slide and the frame, and a magazine for feeding cartridges into the chamber of the barrel. The slide includes a front portion for receiving the barrel where the front portion has a breech face end, a block having an elongate passage for receiving a firing pin mechanism, and a cam surface extending from a lower surface of the block adjacent to the breech face end which functions as a feed ramp for feeding cartridges from the magazine to the chamber. The cam surface is a truncated hemispherical protuberance having a flat surface where the flat surface extends at an angle from the breech face. Positive contact between the breech face and the topmost cartridge is ensured during forward movement of the slide."

The patent application was filed on Dec. 29, 2010 (12/980,521). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,142&OS=8,333,142&RS=8,333,142

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

OMRON Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- OMRON, Kyoto, Japan, has been assigned a patent (8,334,985) developed by seven co-inventors for a "shape measuring apparatus and shape measuring method." The co-inventors are To Sho, Kizugawa, Japan, Takashi Sakai, Nara, Japan, Daisuke Mitsumoto, Nagaokakyo, Japan, Yasuhiro Ohnishi, Kyotanabe, Japan, Takeshi Kojima, Kyoto, Japan, Yasumoto Mori, Joyo, Japan, and Shree Nayar, New York.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A shape measuring apparatus that measures a three-dimensional shape of a measuring target has a lighting device that irradiates the measuring target placed on a stage with light, an imaging device that takes an image of the measuring target, a shape calculating device that calculates orientations of normals at a plurality of points on a surface of the measuring target from an image, the image being obtained by performing imaging with the imaging device while the lighting device irradiates the measuring target with the light, the shape calculating device calculating the three-dimensional shape of the surface of the measuring target from the calculation result of the orientations of the normals, a ranging device that measures a distance from a predetermined reference position with respect to at least one point on the surface of the measuring target, and a determination device that determines a spatial position of the three-dimensional shape of the surface of the measuring target, the three-dimensional shape being obtained by the shape calculating device using information on the distance obtained by the ranging device."

The patent application was filed on Oct. 8, 2010 (12/901,123). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,985&OS=8,334,985&RS=8,334,985

Written by Neha Bharti; edited by Jaya Anand.

***

Euro-Pro Operating Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Euro-Pro Operating, Newton, Mass., has been assigned a patent (8,332,987) developed by five co-inventors for a "quilted fabric towel steam pocket for a steam appliance." The co-inventors are Brian F. Kaminer, Harrison, N.Y., Charles A. Boulos, Milford, Mass., James N. Lewiecki, Essex, Mass., Kathleen V. Jones, Somerville, Mass., and Ognjen Vrdoljak, Laval, Canada.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A fabric steam towel for mounting onto a steam frame of a steam appliance is provided. The pocket includes two complimentary substantially planar layers of fabric joined at their peripheral edge with an open section for mounting onto the steam frame and allowing the open edges to butt against each other. The fabrics are constructed of an outer terry layer and inner material with an upper jersey layer, padding and a lower mesh layer with a 45 degree quilting pattern to improve performance. The fabric is sealed about the frame a first length of a fastener is secured to the inside face along the open edge of one layer with a complimentary length of fastener secured to the inside face of the second layer and extending beyond the edge to allow the open edges of each layer to abut each other and for the fasteners to engage and secure the fabric pocket about the edge of the frame."

The patent application was filed on Aug. 15, 2011 (13/210,175). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,332,987&OS=8,332,987&RS=8,332,987

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Carrier Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Carrier, Farmington, Conn., has been assigned a patent (8,333,088) developed by Michael F. Taras, Fayetteville, N.Y., and Alexander Lifson, Manilus, N.Y., for a "heat exchanger design for improved performance and manufacturability."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A parallel flow heat exchanger is disclosed having heat transfer tubes with a plurality of relatively small channels, which are aligned in a parallel manner, and wherein the heat transfer tubes are in fluid communication with at least one manifold structure, are received in manifold wall openings and are attached to the manifold structure by brazing process The manifold walls and/or the tubes are modified to minimize the likelihood of brazing material plugging or at least partially blocking any of the plurality of channels In one feature, the openings in the manifold structure are formed by deforming the material of the manifold structure outwardly In another feature, the edges of the heat transfer tubes may be formed such that the outermost end channels within each heat transfer tube extend farther inwardly than do the central channels Various design configurations are disclosed."

The patent application was filed on Dec. 26, 2006 (12/443,889). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,088&OS=8,333,088&RS=8,333,088

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

New York Inventor Develops Patent for Power Source for Portable Chargers

ALEXANDRIA, Va., Dec. 24 -- John Mosiello, Levittown, N.Y., has developed a patent (8,334,671) for a "power source for portable chargers."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "The present invention features a portable charger comprising a handle bar attachment means, a charger receptacle attached to the handle bar attachment means, a charging contact disposed within the charger receptacle for accepting a cigarette lighter charger head, wherein the cigarette lighter charger head is operatively connected to a first wire that can be plugged to an electronic device that needs battery recharge; and a set of power source wires operatively connecting the charging contact to a battery unit."

The patent application was filed on Oct. 30, 2009 (12/609,913). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,671&OS=8,334,671&RS=8,334,671

Written by Neha Bharti; edited by Jaya Anand.

***

Delphi Technologies Assigned Patent for Continuous Manufacturing Process for Metal-plastic Hybrid Heat Exchange

ALEXANDRIA, Va., Dec. 24 -- Delphi Technologies, Troy, Mich., has been assigned a patent (8,333,013) developed by Suresh D. Shah, Troy, Mich., Mohinder S. Bhatti, Williamsville, N.Y., and Karl P. Roetsch, Williamsville, N.Y., for a "continuous manufacturing process for metal-plastic hybrid heat exchanger."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "The invention is a method for producing a heat exchanger assembly including the steps of extruding a plastic and an adhesive from a co-extrusion die into a plurality of tubes spaced from each other with each tube having an adhesive disposed on its exterior surface. A plurality of corrugated air fins are serially fed into the co-extrusion die and spaced from each other by a predetermined space and ejected between adjacent tubes with the corrugations extending transversely between the tubes. The adhesive is then cured to secure the tubes to the air fins. The method proceeds by cutting the tubes at each predetermined space with a guillotine shear to produce a plurality of unified heat exchanger cores. The ends of the tubes of each core are inserted into tube slots in manifolds, and the tubes and manifolds are adhesively secured together to define a heat exchanger assembly."

The patent application was filed on Oct. 7, 2008 (12/287,216). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,013&OS=8,333,013&RS=8,333,013

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Industrial Technology Research Institute Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Industrial Technology Research Institute, Hsinchu, Taiwan, has been assigned a patent (8,334,966) developed by Xiang-Dong Mi, Rochester, N.Y., and Stanley W. Stephenson III, Spencerport, N.Y., for a "method of forming a bistable watermark."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A watermark formed of a bistable material, and a method of forming the watermark, are described."

The patent application was filed on March 31, 2009 (12/416,092). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,966&OS=8,334,966&RS=8,334,966

Written by Neha Bharti; edited by Jaya Anand.

***

Cytosorbents, Brodie Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Cytosorbents, Monmouth Junction, N.J., Stefen Brodie, Bala Cynwyd, Pa., and Donald Brodie, Bala Cynwyd, Pa., have been assigned a patent (8,334,094) developed by eight co-inventors for "devices, systems, and methods for reducing levels of pro-inflammatory or anti-inflammatory stimulators or mediators in blood products." The co-inventors are James A. Brady, South Hampton, N.Y., James F. Winchester, New York, Vadim Davankov, Moscow, Maria Tsyurupa, Moscow, Ludmila Pavlova, Moscow, Frank M. Norris, New York, Peter Quartararo Jr., New York, and Jamie A. Salsberg, New York.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "Devices, systems, and methods reduce levels of pro-inflammatory or anti-inflammatory stimulators or mediators in blood by selective adsorption. The devices, systems, and methods are useful in situations where abnormal levels of or unregulated or excessive interaction among pro-inflammatory or anti-inflammatory stimulators or mediators occur, or during events that do induce or have the potential for inducing abnormal production of pro-inflammatory or anti-inflammatory stimulators or mediators. The devices, systems, and methods serve to prevent, control, reduce, or alleviate the severity of the inflammatory response and disease states that are associated with abnormal levels of or unregulated or excessive interaction among pro-inflammatory or anti-inflammatory stimulators or mediators."

The patent application was filed on May 20, 2010 (12/800,683). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,094&OS=8,334,094&RS=8,334,094

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Stryker Trauma Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Stryker Trauma, Switzerland, has been assigned a patent (8,333,766) developed by Adam John Edelhauser, Nyack, N.Y., and Richard J. Tomasheski, Wayne, N.J., for an external fixation system.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "An external fixation system comprising: first and second planar at least part-circular ring elements, the first ring element having a circumferential track extending along the part-circular circumference thereof; a plurality of struts each having a first and second end, the first end of each strut coupled to the first ring by a first connector and the second end of each strut coupled to a second ring by a second connector, the first connector including a spherical joint; the second connector non-rotatably coupled to the second ring, the strut second end being coupled to the second connector by a U-joint; shuttles mounted on the track of the first ring for movement there along with one shuttle coupled to each strut; and means for controlling the angular position of each strut second end and means for controlling the position of each shuttle along the circumferential track on the first ring."

The patent application was filed on March 9, 2010 (12/661,015). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,333,766&OS=8,333,766&RS=8,333,766

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Tokyo Electron Assigned Patent for Semiconductor Device Containing a Buried Threshold Voltage Adjustment Layer and Method of Forming

ALEXANDRIA, Va., Dec. 24 -- Tokyo Electron, Tokyo, has been assigned a patent (8,334,183) developed by Robert D. Clark, Schenectady, N.Y., and Gerrit J. Leusink, Saltpoint, N.Y., for a "semiconductor device containing a buried threshold voltage adjustment layer and method of forming."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method is provided for forming a semiconductor device containing a buried threshold voltage adjustment layer. The method includes providing a substrate containing an interface layer, depositing a first high-k film on the interface layer, depositing a threshold voltage adjustment layer on the first high-k film, and depositing a second high-k film on the threshold voltage adjustment layer such that the threshold voltage adjustment layer is interposed between the first and second high-k films. The semiconductor device containing a patterned gate stack is described."

The patent application was filed on June 25, 2010 (12/823,541). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,183&OS=8,334,183&RS=8,334,183

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

GLOBALFOUNDRIES Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- GLOBALFOUNDRIES, Grand Cayman, Cayman Islands, has been assigned a patent (8,334,177) developed by Witold Maszara, Morgan Hill, Calif., and Hemant Adhikari, Albany, N.Y., for "methods for forming isolated fin structures on bulk semiconductor material."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "Methods are provided for fabricating a semiconductor device. A method comprises forming a layer of a first semiconductor material overlying the bulk substrate and forming a layer of a second semiconductor material overlying the layer of the first semiconductor material. The method further comprises creating a fin pattern mask on the layer of the second semiconductor material and anisotropically etching the layer of the second semiconductor material and the layer of the first semiconductor material using the fin pattern mask as an etch mask. The anisotropic etching results in a fin formed from the second semiconductor material and an exposed region of first semiconductor material underlying the fin. The method further comprises forming an isolation layer in the exposed region of first semiconductor material underlying the fin."

The patent application was filed on Oct. 20, 2011 (13/278,010). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,177&OS=8,334,177&RS=8,334,177

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Tokyo Electron Assigned Patent for Etch Process for Controlling Pattern CD and Integrity in Multi-layer Masks

ALEXANDRIA, Va., Dec. 24 -- Tokyo Electron, Tokyo, has been assigned a patent (8,334,083) developed by Vinh Hoang Luong, Boise, Idaho, and Akiteru Ko, Schenectady, N.Y., for an "etch process for controlling pattern CD and integrity in multi-layer masks."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method of patterning a multi-layer mask is described. The method includes preparing a multi-layer mask on a substrate, wherein the multi-layer mask includes a lithographic layer and an intermediate mask layer underlying the lithographic layer, and wherein the intermediate mask layer comprises a carbon-containing compound. The method further includes: establishing an etch process recipe for transferring a pattern, that is formed in the lithographic layer and characterized by an initial pattern critical dimension (CD), to the intermediate mask layer; establishing at least one parametric relationship between an intermediate pattern CD to be formed in the intermediate mask layer and at least one process parameter, wherein the at least one parametric relationship provides process conditions capable of increasing and decreasing the initial pattern CD to the intermediate pattern CD; selecting a target process condition to achieve a target CD adjustment between the initial pattern CD and the intermediate pattern CD; and transferring the pattern from the lithographic layer to the intermediate mask layer using the target process condition."

The patent application was filed on March 22, 2011 (13/053,215). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,083&OS=8,334,083&RS=8,334,083

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

International Business Machines Assigned Patent for Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same

ALEXANDRIA, Va., Dec. 24 -- International Business Machines, Armonk, N.Y., has been assigned a patent (8,334,088) developed by five co-inventors for "functionalized carbosilane polymers and photoresist compositions containing the same." The co-inventors are Robert D. Allen, San Jose, Calif., Matthew E. Colburn, Schenectady, N.Y., Daniel P. Sanders, San Jose, Calif., Ratnam Sooriyakumaran, San Jose, Calif., and Hoa D. Truong, San Jose, Calif.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 .mu.m.sup.-1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography."

The patent application was filed on Nov. 3, 2010 (12/938,459). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,088&OS=8,334,088&RS=8,334,088

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

Daikin Industries Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- Daikin Industries, Osaka, Japan, has been assigned a patent (8,334,351) developed by four co-inventors for a FEP pellet. The co-inventors are Hideki Kono, Settsu, Japan, Takayuki Hirao, Orangeburg, N.Y., George Lin, Orangeburg, N.Y., and Kazuyuki Fukuda, Settsu, Japan.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "An FEP pellet having a volatile content of 0.2% by weight or less. The FEP pellet satisfies the following requirements (i) and (ii) when used to form a insulating material coating a core wire by extrusion coating at a coating speed of 2,800 ft/min.: (i) an adhesive strength between the insulating material and said core wire of 0.8 kg or more; and (ii) an average number of cone-breaks in the insulating material of one or less per 50,000 feet of the coated core wire."

The patent application was filed on March 2, 2011 (13/038,477). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,351&OS=8,334,351&RS=8,334,351

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

General Electric Assigned Patent for Seal Structure and Associated Method

ALEXANDRIA, Va., Dec. 24 -- General Electric, Niskayuna, N.Y., has been assigned a patent (8,334,053) developed by four co-inventors for a "seal structure and associated method." The co-inventors are Andrew Philip Shapiro, Schenectady, N.Y., Dong-Sil Park, Niskayuna, N.Y., Jian Wu, Fremont, Calif., and Craig Stringer, DuBois, Pa.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A seal structure is provided for an energy storage device. The seal structure includes a first sealing glass composition and a second sealing glass composition joining an ion-conducting first ceramic to an electrically insulating second ceramic. The first sealing glass composition includes less than or equal to about 20 weight percent silica based on the weight of the first sealing glass composition. The second sealing glass composition includes greater than or equal to about 40 weight percent silica based on the weight of the second sealing glass composition. A method for making the seal structure is provided. An article comprising the seal structure is also provided."

The patent application was filed on Jan. 9, 2009 (12/351,131). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,053&OS=8,334,053&RS=8,334,053

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

International Business Machines Assigned Patent for Mixed Lithography with Dual Resist and a Single Pattern Transfer

ALEXANDRIA, Va., Dec. 24 -- International Business Machines, Armonk, N.Y., has been assigned a patent (8,334,090) developed by four co-inventors for a "mixed lithography with dual resist and a single pattern transfer." The co-inventors are Nicholas C. Fuller, North Hills, N.Y., Michael A. Guillorn, Yorktown Heights, N.Y., Balasubramanian S. Pranatharthi Haran, Watervliet, N.Y., and Jyotica V. Patel, Port Chester, N.Y.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "An inorganic electron beam sensitive oxide layer is formed on a carbon based material layer or an underlying layer. The inorganic electron beam sensitive oxide layer is exposed with an electron beam and developed to form patterned oxide regions. An ultraviolet sensitive photoresist layer is applied over the patterned oxide regions and exposed surfaces of the carbon based material layer, and subsequently exposed with an ultraviolet radiation and developed. The combined pattern of the patterned ultraviolet sensitive photoresist and the patterned oxide regions is transferred into the carbon based material layer, and subsequently into the underlying layer to form trenches. The carbon based material layer serves as a robust mask for performing additional pattern transfer into the underlying layer, and may be easily stripped afterwards. The patterned ultraviolet sensitive photoresist, the patterned oxide regions, and the patterned carbon based material layer are subsequently removed."

The patent application was filed on Jan. 28, 2011 (13/015,668). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,090&OS=8,334,090&RS=8,334,090

Written by Satyaban Rath; edited by Hemanta Panigrahi.

***

John Mezzalingua Associates Assigned Patent

ALEXANDRIA, Va., Dec. 24 -- John Mezzalingua Associates, E. Syracuse, N.Y., has been assigned a patent (8,334,048) developed by Mary Krenceski, Troy, N.Y., for a "conductive elastomer and method of applying a conductive coating to elastomeric substrate."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method for forming a conductive elastomer by applying or spray coating a conductive paste onto an elastomeric substrate using a reactive top coat to thin the conductive paste prior to spraying onto the substrate. The use of a reactive topcoat to thin the conductive paste avoids the need for hazardous volatile organic components as solvents to thin the conduct paste and improves the bonding of the conductive paste to the elastomeric substrate once the spray coating is cured."

The patent application was filed on April 27, 2011 (13/095,228). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,334,048&OS=8,334,048&RS=8,334,048

Written by Satyaban Rath; edited by Hemanta Panigrahi.

For more information about Targeted News Service products and services, please contact: Myron Struck, editor, Targeted News Service LLC, Springfield, Va., 703/304-1897; [email protected]; http://targetednews.com.

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