Reports Summarize Risk Management Findings from National Taiwan University (Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory)

2019 DEC 20 (NewsRx) -- By a News Reporter-Staff News Editor at Insurance Daily News -- Current study results on Risk Management have been published. According to news originating from Taipei, Taiwan, by NewsRx correspondents, research stated, “Photoresist materials are indispensable in photolithography, a process used in semiconductor fabrication. The work process and potential hazards in semiconductor production have raised concerns as to adverse health effects.”

Our news journalists obtained a quote from the research from National Taiwan University, “We therefore performed a health risk assessment of occupational exposure to positive photoresists in a single optoelectronic semiconductor factory in Taiwan. Positive photoresists are widely used in the optoelectronic semiconductor industry for photolithography. Occupational exposure was estimated using the Stoffenmanager ® model. Bayesian modeling incorporated available personal air sampling data. We examined the composition and by-products of the photoresists according to descriptions published in the literature and patents; the main compositions assessed were propylene glycol methyl ether acetate (PGMEA), novolac resin, photoactive compound, phenol, cresol, benzene, toluene, and xylene. Reference concentrations for each compound were reassessed and updated if necessary. Calculated hazard quotients were greater than 1 for benzene, phenol, xylene, and PGMEA, indicating that they have the potential for exposures that exceed reference levels. The information from our health risk assessment suggests that benzene and phenol have a higher level of risk than is currently acknowledged.”

According to the news editors, the research concluded: “Undertaking our form of risk assessment in the workplace design phase could identify compounds of major concern, allow for the early implementation of control measures and monitoring strategies, and thereby reduce the level of exposure to health risks that workers face throughout their career.”

For more information on this research see: Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory. Risk Analysis, 2019;39(12):2625-2639. Risk Analysis can be contacted at: Wiley, 111 River St, Hoboken 07030-5774, NJ, USA. (Wiley-Blackwell - http://www.wiley.com/; Risk Analysis - http://onlinelibrary.wiley.com/journal/10.1111/(ISSN)1539-6924)

The news correspondents report that additional information may be obtained from K.Y. Wu, National Taiwan University, Institute of Occupational Medicine and Industrial Hygiene, R721, 17 Xu Zhou Rd, Taipei 10055, Taiwan.

The direct object identifier (DOI) for that additional information is: https://doi.org/10.1111/risa.13366. This DOI is a link to an online electronic document that is either free or for purchase, and can be your direct source for a journal article and its citation.

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